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Wafer Dicing System
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  • Overview
  • Technical Specification

Product overview

Product DescriptionWafer Dicing System

Semiconductor wafer processing system

Wafer Dicing System

Specification

Wave Length 532 nm
Working Power 8 – 15 Watt
CNC Table 180 × 180 mm
Beam Spot ≤20-25 µm (depend on optics config.)
Accuracy ±2 µm
Power Supply 230 VAC+/- 10%, Single Phase
Dimension 1400 × 975 × 1700 mm (approx.)
Computer System Intel® Core™ i3 based CPU or higher
Warm-up Time < 5 minutes
Cooling Method Water-cooled
Power Stability ±5%
Polarization Linear
Controller Interface RS232/USB/Ethernet

*Product specification and data are subject to change or vary without notice to improve reliability function or design.

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